Abstract
This paper describes a microelectromechanical-system-type field emission electron source fabricated as a planar silicon structure bonded with a glass substrate. It consists of a carbon nanotube cathode, beam formation electrodes, and silicon glass vacuum housing, all made in a uniform technological process. The current–voltage characteristics obtained inside a reference vacuum chamber for the two-, three-, and four-electrode configurations have been presented. The possibility of generation of a focused electron beam as well as gas ionization has been investigated. In addition, the lateral electron source has been integrated on the chip with a miniature ion-sorption vacuum pump and hermetically sealed. The use of the micropump significantly improved the stability of field emission current.
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