Abstract
Laser-induced damage thresholds (LIDTs) of silica glasses obtained by the femtosecond soft x-ray free-electron laser (SXFEL, 13.5 nm, 70 fs) and the picosecond soft x-ray laser (SXRL, 13.9 nm, 7 ps) are evaluated. The volume of the hydroxyl group in the silica glasses influenced its LIDTs. The LIDTs obtained in this research by the femtosecond SXFEL and the picosecond SXRL were nearly identical, but were different from that by the nanosecond soft x-ray pulse. The photoionization processes of silica glass in context of the laser-induced damage mechanism (LIDM) are also discussed. In the ultra-short soft x-ray pulse irradiation regime, the LIDM can be speculated to include the spallation process with a scission of bondings.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
