Abstract
AlF 3 thin films were prepared by thermal evaporation at different substrate temperatures and deposition rates. The relationships between optical properties, mechanical properties and laser-induced damage threshold (LIDT) at 355nm of AlF 3 films were discussed. Both absorption and stress increased with increasing substrate temperatures and deposition rates, which was a disadvantage to laser-induced damage resistance. Meanwhile, interfacial adhesion and hardness increased with substrate temperatures and deposition rates, which was an advantage to enhance the LIDT. The LIDT increased from room temperature to 200°C duo to increasing interfacial adhesion and hardness, and then decreased to 300°C duo to increasing absorption and stress. The LIDT decreased with deposition rates due to increasing absorption and stress.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
