Laser-induced chemical vapor deposition of chromium films from chromiumhexacarbonyl using a KrF excimer laser

Abstract

The influence of buffer gas pressure, laser pulse repetition rate, gas flow rate and substrate temperature on the deposition rate of chromium films is compared with the predictions of a gas phase diffusion model. Chromium films were deposited from Cr(CO)6 using a KrF excimer laser. Deposition rates were monitored in situ by measuring the transmittance of a probe beam HeNe laser. The proposed model gives a reasonable description of the measured dependences. These results show that in the present case of large area deposition the process can be described in terms of a diffusion length.