Laser-induced chemical liquid phase deposition method for precipitation of Au-Cu alloy

Abstract

Since the very beginning the laser-assisted methods have become of critical importance for the metal deposition. Various laser techniques allow metal precipitation on the different kinds of the materials. One of them is the Laser-induced chemical liquid phase deposition (LCLD), which is considered among the others to be the most promising and efficient. Indeed, the LCLD method offers convenient way of the metal precipitation with rather high uniformity of the morphology and good electrical properties of the deposits [1–4]. In spite of the achieved high quality of the metal structures the ongoing attempts are undertaken for the improving of the deposition efficiency and the quality.