Abstract
ABSTRACTIn this paper we present results on the deposition of titanium nitride and titanium carbide filmsby pyrolytic laser-induced chemical vapour deposition using a cw TEM CO2 laser beam. TiNlines were deposited onto mild steel substrates while TiC spots were deposited on silicasubstrates. The niicrostructure of the surface and of fractured cross-sections of the films was examined by scanning electron microscopy (SEM). The topography of the films and the thicknessmeasurements were studied both with diamond-stylus and non-contact laser profilometers. Thechemical composition of the TiN films was investigated by electron probe microanalysis (EPMA).X-ray diffraction (XRD) was used for phase and structure analyses of the TiC films.Keywords: Laser chemical vapour deposition, titanium nitride, titanium carbide 1. INTRODUCTIONSince the first report in 19721, and particularly in the course of the last decade, laser-induced chemical vapourdeposition (LC\TD) has been extensively studied appearing as a powerful technique to achieve selective-area
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