Abstract
Recent advances in applications of lasers to induce chemical etching and vapor deposition have raised the firm expectation that the laser chemical techniques may have significant impact on processing materials for microelectronics. In laser-induced chemical etching, it has been shown in various laboratories that a rather wide range of solid materials can be potentially processed by lasers [1,2]. These include the etching of semiconductors such as Si [3–9], Ge [10], GaAs [11–13] and InP [11], metals such as Ta [14], Te [15,16], Ni and Fe [lb], insulators such as SiO2 [15,17,18], and magnetic and ceramic materials such as MnZn ferrites [1a,9a] and TiC-Al2O3 [1b, 16], by various halogen-containing gases excited by ultraviolet, visible and infrared lasers. The laser-enhanced etch rates can be greater than 50 μm/sec and submicron spatial resolution has also been demonstrated.
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