Abstract
Self-supported zircon (ZrSiO 4) coatings have been deposited by means of atmospheric pressure plasma spraying, a high rate deposition method. Zircon is one of the technologically important oxide ceramic material known for its refractoriness, its low thermal expansion and low thermal conductivity. However, it is well known that ZrSiO 4 dissociates into ZrO 2 and SiO 2 in the high temperature plasma torch during plasma spraying, the rapid quenching preventing reverse combination of both components into ZrSiO 4. Usually, high temperature annealing (about 1500 °C) is applied in order to combine SiO 2 and ZrO 2 into ZrSiO 4. In this contribution, we investigate an attractive technological alternative to recombine SiO 2 and ZrO 2 into ZrSiO 4 by laser treatment with a scanning continuous wave CO 2 laser. We also investigate the addition of SiO 2 rich glassy particles to the plasma spray powders in order to facilitate the recombination of ZrO 2 and SiO 2 into ZrSiO 4 during laser treatment. By carefully adjusting the CO 2 laser treatment parameters (laser power density, scanning speed) we show that the SiO 2 and ZrO 2 phases indeed recombine into ZrSiO 4. It appears in this contribution that the addition of low melting point SiO 2 rich particles strongly benefits the reaction of zirconia and silica into zircon.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
