Abstract
In this paper, it is suggested to use pulsed laser radiation to define adhesion of thin metallic films to the substrate and surface defects detection. The preliminary experimental data on Xe- and XeCl-lasers interaction with thin films of metals deposited on glass using technology of vacuum-arc evaporation are presented in the paper. Threshold laser radiation power densities necessary for film detachment from the substrate are determined. Thus, a possibility of testing of thin film adhesion by focused pulsed laser irradiation with known power distribution over cross-section has been demonstrated.
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