Abstract
In this paper we propose a theoretical basis of a new method of Laser Ablation Lithography (LAL) using coherent laser beams interference patterns. The advantage of our method is the absence of the need to use a mask. In our method the profile of nanostructures surface in carbon coating is produced by an interference laser beam pattern and depends on the following parameters: angle of beams convergence, phase difference, and intensity of the beams, and so forth.
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