Laser-produced plasmas as unique x-ray souces for industry and astrophysics

Abstract

Laser produced plasma is one of the brilliant x-ray source that has unique capabilities for use in a wide range of science. Here we describe two examples of laser-produced plasma x-ray source application; one is for the semiconductor device industry and the other is for the astronomy. Extreme ultraviolet (EUV) light sources for microlithography are receiving much attention as an industrial application of laser-produced x-ray source. High power and clean EUV light source, 13.5 nm of wavelength, is developed for mass-production of next generation semiconductor devices. Highest EUV conversion efficiency of 4% has been attained by using low-density and minimum-mass tin targets produced by laser-driven explosion of micro-droplet. In addition, it was recently demonstrated that laser-produced x-ray source is very useful to simulate x-ray astronomical phenomena in the laboratory. A 0.5-keV Planckian x-ray source was created with laser driven implosion for producing non-local-thermodynamical-equilibrium (non-LTE) photoionized plasmas, which is a key to understand astronomical compact objects. Laboratory experiment of non-LTE photoionized plasma offers novel test bed for validation and verification of computational codes used in x-ray astronomy.