Abstract
The results of multi-parametric investigations of laser plasmatron in application to CVD of diamond are presented. Different reaction chamber configurations were studied. CH 4/H 2/Xe(Ar) and CH 4/CO 2/H 2/Ar gas mixtures at total pressure 1.0–4.5 atm were used. Both convection and directed gas flows with velocity up to 50 cm/s delivered reactants to the substrate surface. Diamond film deposition rates up to 40–50 μm/h were reached. CW CO 2 laser beam power and intensity needed for a stationary plasma maintenance under various experimental conditions were found. Laser radiation absorption in plasma was measured. The possibility to combine laser plasma with an auxiliary electrical discharge is demonstrated. A comparison between laser and other plasma CVD techniques is made.
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