Abstract
We have demonstrated deposition of refractory metals, chromium, molybdenum, and tungsten, on various substrates by photodissociating vapor-phase metal hexacarbonyls. Ultraviolet photons were obtained from a 150-mW peak power, pulsed copper hollow cathode laser and from a 10-mJ 20-nsecl pulse ArF laser. Localized deposits were obtained by tightly focusing the light immediately above the substrate surface and adding 760 Torr of He to minimize diffusion of the photolyzed metal atoms in the vein of previous experiments.
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