Abstract
In order to improve the laser micro-machinability of borosilicate glass, the glass surface was doped with metal (silver or copper) ions by an electric field-assisted ion-exchange method. Doped ions drifted and diffused into the glass substrate under a DC electric field. The concentration of metal ions within the doped area was approximately constant because the ion penetration was caused by substitution between dopant metal and inherent sodium ions. Nanosecond ultraviolet laser irradiation of metal-containing regions produced flat, smooth and defect-free holes. However, the shapes of holes were degraded when the processed hole bottoms reached ion penetration depths. A numerical analysis of ionic drift-diffusion behaviour in glass material under an electric field was also carried out. The calculated results for penetration depth and ionic flux showed good agreement with the measured values.
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