Abstract
We present a number of important characteristics of laser techniques for preparation of nanostructured thin films with foci on laser ablation (LA) and laser-assisted chemical vapor decomposition (LCVD). Size-related features and structures of the deposited layers are associated with process parameters. Whenever possible, the performance of the deposits is compared to that of films prepared by other methods ( e.g., physical vapor synthesis such as gas deposition, sputtering, etc.). The LA and LCVD methods allow a wide variety of materials to be prepared. A number of promising applications emerge when one combines this versatility with the potential for making certain types of nanostructured layers. These possibilities are also discussed.
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