Abstract
We present the results of experiments on annealing the surface layer of porous silicon by pulsed IR laser radiation. The character of laser-induced modification has been studied using IR spectroscopy and transmission electron microscopy. It is shown that the proposed method can be used to obtain a Si:SiO2 composite.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
