Abstract
CO 2 laser-induced chemical vapor deposition of titanium diboride (TiB 2) has been performed on mullite substrates by the hydrogen reduction of titanium tetrachloride and boron trichloride. The influence of the hydrogen concentration on the morphology, growth rate and nucleation rate will be discussed. These results suggest that atomic hydrogen may play an important role in the deposition process. An atomic hydrogen source, a hot filament, has therefore been constructed. The results of the hot filament-enhanced depositions on thermally oxidized silicon will be presented.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
