Laser-enhanced gas–surface chemistry: Basic processes and applications

Abstract

Chemical reactions in homogeneous systems activated by laser radiation have been extensively investigated for many years. The applications of lasers to promote gas–surface interactions have just begun to be realized. The purpose of the paper is to examine the fundamental processes involved in laser-enhanced gas–surface chemistry with particular emphases on aspects directly related to chemical etching of solids. Specifically, three basic surface processes, i.e., adsorption, product formation, and desorption affected by the presence of the laser radiation field, are discussed. Current studies on laser-induced chemical etching including etch rates, spatial resolution, directionality, and selectivity are reviewed. Examples to illustrate the basic laser-stimulated processes and possible applications of the laser technique to material processing are also given.