Abstract
High-density nanohole arrays have a great value in many fields. However, fabrication of a sub-10 nm nanohole array in a simple and low-cost manner is extremely challenging using existing techniques. In this work, we present a one-step laser ablation method to prepare sub-10 nm nanohole arrays on the island-shaped indium thin film in the atmosphere condition with facile, low-cost and high-producing features. Induced by nanosecond laser irradiation, the center of an indium nano-island has a higher temperature than the edge region, and the nanohole forms on the top of each indium nano-island based on the shape-dependent thermal effect. The nanohole number on unit area can reach to 416/μm2 due to the dense distribution. This simple method can achieve a 3 nm nanohole that is the smallest nanohole obtained by laser fabrication technologies up to now as far as we know, reaching to λ/135 far beyond the optical diffraction limit. A primarily shape-dependent ablation mechanism is proposed and briefly explains the nanohole formation.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
