Laser direct-writing lithography equipment system for rapid and μm-precision fabrication on curved surfaces with large sag heights.

Abstract

A novel laser direct writing lithography equipment system was proposed to realize rapid and μm-precision fabrication on curved surfaces with large curvatures and large sag heights. Through detailed design, analysis, simulation, and measurement, it showed that the system was able to continuously, linearly and rapidly change the focus position in z coordinate. For demonstration, a concentric-circular photoresist grating with a sag height of 5.2 mm and a designed line width/space of 12.5 μm/25 μm was fabricated within 40 s on a convex K9 glass substrate surface with a curvature radius of 32.77 mm. When combining with the movement of the x-y-z stage, the system could fabricate the micropatterns on curved surfaces with larger dimensions. Further, the system possessed the general principles of optics, mechanics, and automation for μm-precision 3D microfabrication.