Abstract
Electron transport in a variable-thickness ultra-thin SiO2-on-Si structure (1.0–6.5nm) is observed to be enhanced substantially by X-ray radiation-induced damage as detected by a novel fast-pulsed laser technique. This method involves optically stimulated electron injection into the oxide followed by detection of transport, trapping and recombination rates using time-dependent electric-field induced second-harmonic generation (EFISH) arising from charge separation at the interface. This detection technique provides a contactless, noninvasive alternative to electrical characterization.
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