Laser deposition of amorphous diamond thin films assisted by O plasma

Abstract

Amorphous diamond thin films have been deposited by pulsed excimer laser (XECL 308nm, 23ns, 300mj) and eched by O plasma. The films were studied with CCD microscopy, SEM, Raman spectroscopy. The films showed an increased surface particle density, a decreased optical transparency, as well as a higher sp3 content. The plasma particle have more higher energy and the duration is very short, so the plasma flux is intensive and this is suitable to deposit amorphous thin films and other metestable material. The role of O plasma have concluded, the characteristic of graphite to diamond have been discussed.