Abstract

SiO2 nanostructure is synthesized by the Sol-Gel method and thin films are prepared using dip coating technique. The effect of laser densification is studied. X-ray Diffraction (XRD), Fourier Transformation Infrared Spectrometer (FTIR), and Field Emission Scanning Electron Microscopy (FESEM) are used to analyze the samples. The results show that the silica nanoparticles are successfully synthesized by the sol-gel method after laser densification. XRD patterns show that cristobalite structure is observed from diode laser (410 nm) rather than diode laser (532 nm). FESEM images showed that the shape of nano silica is spherical and the particles size is in nano range (? 100 nm). It is concluded that the spherical nanocrystal structure of silica thin films is successfully densified by Doide laser (410 nm).

Highlights

  • Nanomaterials have attracted extensive attention due to the rapid development of Nanoscience and Nanotechnology in multidisciplinary fields [1]

  • The Fourier Transformation Infrared Spectrometer (FTIR) spectra for SiO2 samples after densification process with two different Diode lasers are shown in Fig.3 which show three bands of Si–O–Si bond vibration

  • Symmetric and asymmetric fundamental stretching vibrations of CH2 and CH3 groups belonging to alkoxide and solvent residues appear for diode laser (532 nm) only due to its amorphous structure

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Summary

Introduction

Nanomaterials have attracted extensive attention due to the rapid development of Nanoscience and Nanotechnology in multidisciplinary fields [1]. These include different design, method, characterization, and interaction processes in nanometer range [2]. The silica nanostructures are synthesized using different techniques involving CVD (chemical vapor deposition), plasma synthesis, combustion method, hydrothermal techniques and sol- gel synthesis [3]. Sol-Gel process could be used to fabricate various photonic materials in different forms such as coatings, optical fibers, and thin films for optical applications [4].

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