Abstract
Dry laser cleaning (DLC) and laser shockwave cleaning (LSC) are used to remove the particulate contamination from SiO2 sol-gel optical films. The results show that the LSC with a shockwave initiated by plasma formation under a focused laser beam pulse offers much better efficiency than DLC. Silica particles up to 10μm on SiO2 films can be removed without substrate damage at a gap distance of 0.5 mm, and a more uniform surface microstructure can be obtained after LSC. Furthermore, it is demonstrated that the transmittance of contaminated SiO2 films can be restored to the as-deposited value after the LSC on dispersed-particle zones. LSC has potential applications in engineering-oriented large components.
Sign-in/Register to access full text options 
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
