Laser-assisted methods for deposition, diagnostics and modification of optical thin films

Abstract

A cw CO 2 laser with a power of 200 W has been used to evaporate thin multilayer films of HfO 2SiO 2 and ZrO 2SiO 2. Higher values of laser damage resistance were found in comparison to similar layers deposited by electron beam evaporation. We also used the laser beam as a diagnostic tool to characterize optical thin films by absorption and laser damage resistance. We investigated the increase in resistance to laser damage of optical layers by laser irradiation of the substrates under vacuum immediately before the coating process. Moreover, we investigated the optical properties of oxide films after uv-laser irradiation delivered from a KrF excimer laser.