Abstract
We report the first observation of a laser induced periodic surface structure (LIPSS) by THz-FEL (THz free electron laser) irradiation on the surface of semiconductor Si. So far LIPSS has been studied only in NIR region by fs-laser, but LIPSS found in THz-FIR region by THz-FEL shows new features, such as, the fineness of the periodic interval is close to 1/25 of the wavelength.
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