Abstract
Plasma-generation and profile-control technologies for ultra-large-area processing of flat-panel displays have been developed by employing multiple low-inductance antenna (LIA) modules to sustain meter-scale inductively-coupled plasmas, as a promising candidate for high-density (1011–1012 cm−3) plasma sources as well as high-quality (low-damage) plasma processing. Our proposal of the unique source configuration is based on the principle of multiple operation and integrated control of LIA modules. Each of the LIA modules consists of a U-shaped internal antenna with a scale-length much smaller than 1/4 wavelength of the high-frequency power transmission to avoid problems associated with standing-wave effects. Furthermore, for active control of power-deposition profiles to attain desired plasma distributions, each of the LIA modules is equipped with an independent RF power amplifier. Experiments with a meter-scale reactor demonstrated achievements of high plasma densities above 1011 cm−3 in argon and uniformity control capabilities. The results indicated that the plasma production and/or control technologies with the LIA modules are promising for a variety of FPD processes.
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