Abstract
A very easy and flexible approach to fabricate large area, petal-like nanopattern for surface enhanced Raman scattering using soft imprint lithography are presented here. The morphology of the petal-like nanopattern can be transferred truly using the h-PDMS and diluted PMMA molding template. By means of Au metal deposition, a SERS substrate with high enhancement factor over large area, which is still a problem, was produced easily. The morphology and Raman enhancement effect of the 3D nanopattern are characterized by SEM, AFM and SERS. The results show that the petal-like 3D nanopattern has high SERS enhancement factor (order of 1.0×108) and could be a promising low cost and high performance SERS active substrate.
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