Abstract
ABSTRACT Topological semimetals represent a new class of topological materials, which are highly desirable for both physics frontier and electronics applications owing to their nontrivial band structures and topologically protected surface states. The large-area fabrication of high-quality topological semimetal films is the prerequisite step to realize their practical applications. Its progress has located in its infant period. In this mini-review, we summarize several typical techniques for the fabrication of large-area 2D layered topological semimetal films. The recent progress in these large-area films for electronics, optoelectronics, terahertz, and spintronics applications is briefly reviewed. It is anticipated that with the rapid development of scalable, reliable, and low-cost production techniques and improved functional realization, large-area 2D layered topological semimetals would find the wide commercial applications in electronics, energy and beyond.
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