Abstract
A novel approach based on the Poisson spot effect in a conventional optical lithographysystem is presented for fabricating large-scale ordered ring patterns at low cost, in whichthe pattern geometries are tuned by controlling the exposure dose and deliberate design ofthe mask patterns. Following this by cryogenic deep etching, the ring patternsare transferred into Si substrates, resulting in various vertical tubular Si arraystructures. Microscopic analysis indicates that the as-fabricated Si microtubeshave smooth interior and exterior surfaces that are uniform in size, shape andwall-thickness, which exhibit potential applications as electronic, biological and medicaldevices.
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