Large Co Cluster Deposition on Naturally and Artificially Patterned Substrates

Abstract

Monodispersed Co clusters with mean cluster diameter d=13 nm have been deposited on a stepped graphite surface and a lithography-patterned Si wafer using a plasma-gas-condensation cluster beam deposition apparatus. High-resolution scanning electron microscope observation indicates that 1) cluster aggregation is much more limited at the steps than on the flat terrace regions of the graphite surface, and 2) cluster density is much higher in the grooves than on the flat top of the lithography-patterned Si wafers. These results suggest the possibility of the regular arrangement of monodispersed Co clusters if the pattern size (the width of grooves and tops) is comparable with the cluster size.