Abstract

In this contribution, we describe a room-temperature, template-free, single-step approach for the growth of functional crystalline silicon nanostructures with tailored porosity and photonic properties. The method employs a plasma-assisted nanoparticle synthesis reactor in combination with a supersonic jet deposition stage, in what we call nanoparticle jet deposition or plasma-assisted, supersonic aerosol jet deposition. The relationship between plasma parameters, nanoparticle impaction conditions and the resulting silicon material structural characteristics is investigated. This understanding is successfully employed for the production of porous 1D photonic crystals obtained by periodically modulating the density of the hierarchical silicon nanostructures and hence their local refractive index. The open porosity of this device is then exploited in a proof of concept optical chemical sensor.

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