Abstract
Nanoparticle alignment on the substrate attracts considerable attention due to its wide application in different fields, such as mechanical control, small size electronics, bio/chemical sensing, molecular manipulation, and energy harvesting. However, precise nanoparticle positioning and deposition control with high fidelity are still challenging. Herein, a straightforward strategy for high quality nanoparticle-alignment by chemical lift-off lithography (CLL) is demonstrated. This technique creates high resolution self-assembled monolayer (SAM) chemical patterns on gold substrates, enabling nanoparticle-selective deposition and precise alignment. The fabricated nanoparticle arrangement geometries and dimensions are well-controllable in a large area. With proper nanoparticle surface functionality control and adequate substrate molecular manipulation, well-defined nanoparticle arrays with single-particle-wide alignment resolution are achieved.
Highlights
Nanoparticle alignment on the substrate attracts considerable attention due to its wide application in different fields, such as mechanical control, small size electronics, bio/chemical sensing, molecular manipulation, and energy harvesting
Nanomaterials 2018, 8, 71 very narrow molecular gap is required to position targets down to the single particle scale, which is extremely difficult to control with conventional fabrication processes
Due to high achievable resolution, robust operation, and sufficient integrity properties of the technique, we realized that the chemical lift-off lithography (CLL)-reated molecular patterns are highly potent in providing precise guidance for aligning nanoparticles in large areas
Summary
Nanoparticle alignment on the substrate attracts considerable attention due to its wide application in different fields, such as mechanical control, small size electronics, bio/chemical sensing, molecular manipulation, and energy harvesting. Due to high achievable resolution, robust operation, and sufficient integrity properties of the technique, we realized that the CLL-reated molecular patterns are highly potent in providing precise guidance for aligning nanoparticles in large areas. It is expected that the functionality of post-lift off regions should be very different from the original hydroxyl-terminated MCU SAM-modified areas, which provides an opportunity to differentiate the surface property of a depositing nanoparticle.
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