Abstract
We fabricated the large-area (3 × 3 cm2) freestanding nanometer thickness graphite film (NGF) using transfer free process. NGF was grown on Cu foil using CVD and Cu foil is used as the frame of NGF freestanding film. Thickness of the NGF was controlled by gas flow and growth time. Transfer-free process was achieved by selective etching of Cu foil and dipping NGF in alcohol of low surface tension. Freestanding NGF reveals excellent EUV transmittance. This method allowed us to simplify the fabrication process for freestanding film without transfer process and demonstrated a possibility for HVM of pellicle for EUV lithography.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
