Abstract
ABSTRACTZnO thin films are of interest for an array of applications, including: light emitters, photovoltaics, sensors and transparent contacts, among others. Production routes for ZnO include sputtering, MBE and MOCVD. This paper focuses on our efforts to produce a large scale MOCVD thin film production tool and the results obtained from the reactor. Specifically, we have constructed a tool with a 16” wafer carrier that uniformly deposits ZnO films on 38×2” wafers simultaneously. The reactor operates at low pressure (<0.1 Atmosphere) and through 700°C. High quality, uniform films have been deposited on an array of substrates. Al-doped films exhibited resisitivities in the 1×10-3 ohm-cm range and transmissivity greater than 80%. Film morphology and crystallinity are a function of process parameters. The large area oxide MOCVD reactor design challenges and results are summarized. Tool performance and ZnO thin film quality are reviewed, as well as preliminary ZnO contact performance on GaN LEDs.
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