Large-area, low-cost near-infrared meta-surface reflector based on a pixelated two-dimensional silicon disk array.

Abstract

All-dielectric meta-surfaces composed of dielectric meta-atoms with electric and magnetic multipole resonances provide a low loss alternative to plasmonic meta-surfaces in some optical research fields such as meta-lens and meta-surface holography. We utilize the digital holography lithography technique to obtain the large area meta-surface perfect reflector made of high refractive index and low loss silicon discs arrays, with the capability to delicately control the optical response in the near infrared spectrum. Three types of meta-surface reflectors (discs, truncated cones and diamond-shaped discs) were fabricated, which correspondingly exhibited nearly 1 peak reflectance and greater than 97% average reflectance in their respective perfect reflectance spectral regions. Digital holography lithography only takes 4 min to fabricate millions of photoresist disks over an area of 100 mm2, which is high processing efficiency and low cost. The fabrication strategy opens a new avenue for the production of large-area meta-surfaces in the optical field, especially in the mass production of optical communication devices, semiconductor lasers, etc.