Abstract
A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration,λ = 46.9 nm) wassuccessfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), largearea (0.1 mm2) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA:polymethylmethacrylate) substrates. The experiments allowed a systematical investigationof the degree of mutual coherence of the source, giving a clear indication that theinterference lithography can be pushed down to the ultimate resolution limit ofλ/4.
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