Langmuir probe and optical emission spectroscopy studies for RF magnetron sputtering during TiON thin film deposition

Abstract

Low-pressure plasma of gas mixture of Ar, O2 and N2 generated by RF magnetron sputtering was characterized by Langmuir probe and optical emission spectroscopy (OES). The electron temperature (Te), ion density (ni) and electron energy distribution function (EEDF) in Ar-O2-N2 plasma atmosphere were calculated from I-V characteristic of Langmuir probe. Boltzmann plot method was applied for calculating the vibrational temperature (Tvib) of the second positive system of N2 (N2SPS) in Ar-O2-N2 plasma. The Te, ni, EEDF and Tvib in Ar-O2-N2 plasma were studied as a function of O2 percentages. It was found, the Tvib increased from 0.47 eV to 0.55 eV as the oxygen percentage in Ar-N2-O2 plasma increased from 10% to 40%. Further, the Te increased from 1.6 eV to 3 eV as the O2 concentration increased from 10% to 40%.