Laboratory test of a LSM-based narrow bandpass and high throughput camera for Tokamak plasma imaging between 100 and 200 Å

Abstract

A narrow-bandpass (∼7 Å) and high-throughput (f/5.5) extreme ultraviolet (XUV) camera using layered synthetic microstructure (LSM) coated optics has been built and tested at the Johns Hopkins University laboratory in order to image tokamak plasma emission between 100 and 200 Å. The LSM camera was tested with a Penning ionization discharge emission source. The test measures the spectral bandpass, the spatial resolution, and the relative photosensitivities. The XUV camera will be used to measure the O vi 150 Å line brightness on the Phaedrus-T tokamak with a tangential view to investigate the impurity transport.