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Abstract
In a comprehensive study, we demonstrate the performance and typical application scenarios for laboratory-based nano-computed tomography in materials research on various samples. Specifically, we focus on a projection magnification system with a nano focus source. The imaging resolution is quantified with common 2D test structures and validated in 3D applications by means of the Fourier Shell Correlation. As representative application examples from nowadays material research, we show metallization processes in multilayer integrated circuits, aging in lithium battery electrodes, and volumetric of metallic sub-micrometer fillers of composites. Thus, the laboratory system provides the unique possibility to image non-destructively structures in the range of 170–190 nanometers, even for high-density materials.
Highlights
To characterize the system’s modulation transfer function (MTF) as a more quantitative reference for the resolution, in a previous study we have already shown that the MTF of the imaging system (Figure 4) can be approximately described by the superposition of a Gaussian PSF with 250 nm full width at half maximum (FWHM) with an additional background of about 1.1 μm FWHM
The focus of the electron beam was manually scanned over edges on the patterned transmission target, to obtain an independent measure of the source point spread function by evaluating the radiation intensity measured in this process
For the visible resolution, which corresponds to the 10% MTF level, 3200 lp/mm is achieved with the high-resolution portion
Summary
Publisher’s Note: MDPI stays neutral with regard to jurisdictional claims in published maps and institutional affiliations. Research and application of high-resolution X-ray microscopy are still mainly carried out in large synchrotron facilities [1,2]. Optics-based full-field microscope setups derived from there have already made the leap into the laboratory [3], and such commercial devices can achieve resolutions below 100 nm [4,5]. Due to technical challenges in the fabrication of X-ray optical elements, these kinds of devices are restricted to low energies
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