Abstract
Conditions are determined for the formation of X-ray refractive lenses with kinoform fern-like profile in resist layers of PMMA and SU-8 by deep X-ray lithography. Based on the simulation results of the main steps of mask fabrication and pattern formation the technological process parameters have been defined. The features of microstructure formation in polymer layers more than 100 μm thick are described. The properties of the obtained microstructures have been analyzed. First tests have been performed with SU-8 lenses. The preliminary measured spot size is less a 8.2 μm.
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