Kink-effect 개선을 위한 세 개의 분리된 N+ 구조를 지닌 대칭형 듀얼 게이트 단결정 TFT 구조에 대한 연구

Abstract

In this paper, we have simulated a Symmetric Dual-gate Single-Si TFT which has three split floating <TEX>$n^{+}$</TEX> zones. This structure reduces the kink-effect drastically and improves the on-current. Due to the separated floating <TEX>$n^{+}$</TEX> zones, the transistor channel region is split into four zones with different lengths defined by a floating <TEX>$n^{+}$</TEX> region. This structure allows an effective reduction of the kink-effect depending on the length of two sub-channels. The on-current of the proposed dual-gate structure is 0.9 mA while that of the conventional dual-gate structure is 0.5 mA at a 12 V drain voltage and a 7 V gate voltage. This results show a <TEX>$80 {\%}$</TEX> enhancement in on-current by adding two floating <TEX>$n^{+}$</TEX> zones. Moreover we observed the reduction of electric field In the channel region compared to conventional single-gate TFT and the reduction of the output conductance in the saturation region. In addition we also confirmed the reduction of hole concentration in the channel region so that the kink-effect reduces effectively.