Abstract

The kinetics of reversible resistivity changes during structural relaxation in three (Co1x Fex)75Si10B15 metallic glasses (x = 0.1. 0.25 and 0.5) was examined in the temperature range from 280 to 400 ° C using a log-normal distribution model in relaxation times which was developed by Nowick and Berry. The mean activation energies are around 2.0 eV and mean pre-exponential factors are around 10−16 s and these values are almost independent on the Co/Fe ratio. The annealing temperature dependence of the width of distribution was obtained, and it was found that both the activation energy and the pre-exponential factor are distributed widely and the degree of their distributions decreases with increasing Fe contents. From these results, the microscopic mechanism of local atomic rearrangements during structural relaxation has been discussed.

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