Abstract
This paper investigates DC plasma polymerization kinetics by combining plasma parameters with film deposition rate in different conditions. The monomers hexamethyldisiloxane (HMDSO) and pyrrole were used. Both single and double Langmuir probes were used to measure the plasma parameters in pulsed power and continuous discharges. In order to avoid probe tip contamination, the probe was heated. Plasma density and electron temperature are reported. The electron current wave form is obtained in pulse power conditions. From the data, a plasma polymerization model is proposed. The conclusion is that the monomer molecules and free radicals adsorbed on the substrate surface react with activated sites produced by high energy ions bombarding the film, resulting in polymerization at the film surface.
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