Abstract
Abstract We proposed an energy-dependent kinetic Monte Carlo approach to simulate the reflection high-energy electron diffraction intensity during the three-dimensional growth of BaTiO3 thin film using pulsed laser deposition. In the simulation, we employed the Born–Mayer–Huggins potential and assumed the overhanging of atoms in the deposition and diffusion process. The factors considered include the incident kinetic energy, laser repetition rate and mean deposition rate. By changing the values relative to every factor, the effects on the reflection high-energy electron diffraction (RHEED) intensity were studied. Being in good agreement with the experimental observations, the results provide an understanding on the evolution of the morphology about BaTiO3 thin film and a basic exploration of the epitaxial growth process of ionic oxides with perovskite-type structures.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.