Kinetic Monte Carlo simulation of {1 1 1}-oriented SiC film with chemical vapor deposition

Abstract

A three-dimensional atomic-scale kinetic Monte Carlo (KMC) model of {111}-oriented SiC film deposited by chemical vapor deposition is established in this paper. The growth process of {111}-oriented atomic-scale SiC film is simulated. The model includes two parts: the first is kinetic process of chemical reaction and the second is deposition and diffusion of substrate surface. In this model, the relationship between temperature and growth rate, surface roughness and relative density and the relationship between growth rate and surface roughness and relative density are studied. The result indicates that the growth of film has three stages including formation of little islets, mergence and expanding of islets and dynamic balance between islets. With increase of substrate temperature, deposition rate, surface roughness and height of film all increase. With increase of deposition rate, surface roughness increases while relative density decreases.