Abstract
A model that describes amorphous–nanocrystalline transformation induced by either thermal annealing or millisecond thermal pulse is proposed. Generation of nanocrystals in the film is a relay process in which a transformation wave moves from the heated surface. The proposed approach takes into account specific features of the pulsed thermal source: surface type, short-term effect, and high intensity. Small size, significantly nonequilibrium character of the system, thermal stress, internal thermal fluctuations, and external noise of energy source are taken into consideration.
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