Abstract

Atomically clean surfaces of semiconducting oxides efficiently mediate the interconversion of gas-phase O2 and solid-phase oxygen interstitial atoms (Oi). First-principles calculations together with mesoscale microkinetic modeling are employed for TiO2(110) to determine reaction pathways, assess appropriate rate expressions, and obtain corresponding activation energies and pre-exponential factors. The Fermi energy (EF) at the surface influences the rate-determining step for both injection and annihilation of Oi. The barriers range between 0.72-0.82 eV for injection and 0.60-2.34 eV for annihilation and may be manipulated through intentional control of EF. At equilibrium, the microkinetic model and first-principles calculations indicate that interconversion of Oi species in the first and second sublayers limits the rate. The effective pre-exponential factors for injection and annihilation are surprisingly low, probably resulting from the use of simple Langmuir-like rate expressions to describe a complicated kinetic sequence.

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