Abstract
100 nm step scan projection lithography is the prevailing one tackled in China, with its stage as one of the most critical subsystems to realize the ultra-precision performance of lithography. Rough-fine motion structure is used in the stage, and the requirements to motion control system are extremely strict because of the high performance indexes in synchronization motion(maximal moving average error is less than 5 nm and maximal moving standard deviation is less than 12 nm). The structure of wafer stage and reticle stage are analyzed, the components in motion control system which help to realize high precision are presented, and the operating principles and characteristics of trajectory planning, measurement system and control strategy are illustrated. In order to improve the control precision, disturbances deteriorating the performance of the control system are analyzed, and the corresponding compensation strategies are presented, then the strategies calibrating the controller parameters are discussed. The key points in step scan projection lithography motion control are studied comprehensively and the corresponding solutions are presented, which can provide guidance for the ultra-precision performance of lithography equipment.
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