Abstract

A difference in surface potentials between organosilane self-assembled monolayers (SAMs) was measured by means of Kelvin probe force microscopy (KFM). The SAMs were deposited on a single Si substrate from alkylsilane, that is, octadecyltrimethoxysilane (ODS) [H3C(CH2)17Si(OCH3)3], and fluoroalkylsilane (FAS), that is, heptadecafluoro-1,1,2,2-tetrahydro-decyl-1-trimethoxysilane [F3C(CF2)7(CH2)2Si(OCH3)3]. The locations of these SAMs on the substrate were defined by means of a photolithographic technique. The regions terminated with ODS and FAS were clearly distinguished by KFM with the surface potential difference between the ODS- and FAS-terminated surfaces under optimized imaging conditions. The surface potential of the FAS-terminated region was 170∼180 mV lower than the potential of the ODS-terminated surface. The origin of such a low surface potential of FAS-SAM was ascribed to the larger dipole moment of the FAS molecule induced by the electron negativity of F atoms as estimated from a molecular orbital calculation.

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